The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2004
Filed:
Apr. 17, 2003
Applicant:
Inventors:
Kuniaki Nagayama, Tokyo, JP;
Antony Stanckev Dimitrov, Ibaraki, JP;
Assignee:
Research Development Corporation of Japan, Saitama, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/18 ;
U.S. Cl.
CPC ...
B05D 1/18 ;
Abstract
A method of forming a particle film on a surface of a solid or liquid substrate involves contacting the substrate, in the presence of a gas, with a liquid medium containing a plurality of particles suspended therein. A liquid meniscus is thereby formed between the substrate and the gas. An edge of the liquid meniscus is moved relative to the substrate, so that said particles in the liquid medium form the particle film on the surface of the substrate.
Nagayama, Kuniaki. (2004). Method for producing a continuous, large-area particle film (U.S. Patent No. 6770330). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6770330
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile