The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2004
Filed:
Sep. 29, 2000
Applicant:
Inventor:
Fumiyoshi Ono, Shiojiri, JP;
Assignee:
Showa Denko K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 1/300 ;
U.S. Cl.
CPC ...
C09K 1/300 ;
Abstract
A slurry for polishing a metal film of a semiconductor device, comprising alumina-type fine particles having specific properties and composition, a polishing accelerator and water.
Ono, Fumiyoshi. (2004). Composition for polishing metal on semiconductor wafer and method of using same (U.S. Patent No. 6770218). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6770218
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile