The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Dec. 23, 2002
Applicant:
Inventors:
Erik R. Deutsch, Cambridge, MA (US);
Malcolm C. Smith, Charlton, MA (US);
Assignee:
Polychromix Corporation, Wilmington, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/18 ;
U.S. Cl.
CPC ...
G02B 5/18 ;
Abstract
A diffraction grating providing reduced polarization dependent loss. The elements of pixels of the diffraction grating are fixed or actuated such that some grating elements are actuated to correspond to a positive polarization dependent loss and others are actuated to correspond to a negative polarization dependent loss. The pixels may include multiples of three grating elements or multiples of four grating elements. An electrostatic beam structure providing increased actuation in a direction away from a substrate may be used in a diffraction grating providing reduced polarization dependent loss.