The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Jun. 04, 2002
Stefan Eggers, Wentorf, DE;
Claas Andreae, Brietlingen, DE;
Other;
Abstract
The invention relates to an exposure apparatus, in particular for wavelength-dependent light outcoupling, in which at least one preferably wavelength-dependent mirror layer is located within an exposure beam path of a lamp, which mirror layer is used to divide the beam path into a spectral portion used for exposure, and into an unused spectral portion. The object of the invention is to provide an exposure apparatus and a method with which the quality of exposure can be optimized using simple means. The object on which the invention is based is attained according to the invention by locating a mirror in the beam path of the unused region of the spectrum that reflects the unused spectral range in the direction of a mirror layer, and a portion of this is projected onto a viewing screen for adjustment purposes.