The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Nov. 20, 2003
Applicant:
Inventors:
Assignee:
Shin Etsu Chemical Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/04 ;
U.S. Cl.
CPC ...
C07F 7/04 ;
Abstract
When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst, and introducing an organohalide-containing gas feed into the reactor, the partial pressure of organohalide gas in the gas feed is manipulated so as to keep the temperature within the reactor substantially constant. The precise control of reactor internal temperature ensures that organohalosilanes with a higher useful silane content are produced in a safe and inexpensive manner and in high yields from the contact mass having perpetually changing reactivity.