The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6767965 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 27, 2004

Filed:

Jan. 10, 2003
Applicant:
Inventors:

Xuequan Zhang, Taejeon, KR;

Jae Gon Lim, Taejeon, KR;

Jung Hyun Baik, Taegu, KR;

Hyun Joon Kim, Taejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08L 2/506 ; C08F / ;
U.S. Cl.
CPC ...
C08L 2/506 ; C08F / ;
Abstract

The present invention provides a method of preparing a monomer-grafted syndiotactic polystyrene with polarity, which comprises (a) forming swollen syndiotactic polystyrene by mixing with a syndiotactic polystyrene in powder state and a radical initiator in a solvent at the temperature of 40-80° C. using a batch reactor, and (b) grafting a monomer selected from the group consisting of maleic anhydride, maleic imide and derivatives thereof onto the swollen syndiotactic polystyrene.


Find Patent Forward Citations

Zhang, Xuequan. (2004). Method of preparing monomer-grafted syndiotactic polystyrene with polarity (U.S. Patent No. 6767965). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6767965

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…