The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2004
Filed:
Jul. 16, 2001
Jost Heintzenberg, Leipzig, DE;
Robert J. Charlson, Seattle, WA (US);
Frank Stratmann, Leipzig, DE;
Manfred Wendisch, Parthenstein, DE;
Sabine Wurzler, Leipzig, DE;
Abstract
The present invention relates to a method for investigating the behavior of particles or droplets in a gas-vapor mixture inside a flow device, which is useful for studying cloud dynamical and microphysical processes. The invention allows adjustment and/or control of the thermodynamic system parameters based on the observed behavior of an internal standard with known properties, thus achieving a well-defined vapor concentration and saturation field inside the flow device. By injecting particles or droplets to be investigated into this well defined flow device, and measuring the size of the particles or droplets, the activation and growth or shrinking behavior of the particles or droplets may be determined using a mathematical model of the fluid, thermodynamic, and chemical conditions of the flow device.