The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Mar. 25, 2003
You-Seung Jin, Seoul, KR;
Jong-Hyon Ahn, Kyunggi-do, KR;
Abstract
A semiconductor device having a capacitor of an MIM structure and a method of forming the same are described. The semiconductor device includes a semiconductor substrate; a first bottom interconnection formed over the semiconductor substrate; an intermetal dielectric layer formed over the semiconductor substrate; a plurality of openings exposing the first bottom interconnection through the intermetal dielectric layer; a bottom electrode conformally formed on the inside wall of the openings, on the exposed surface of the first bottom interconnection and on the intermetal dielectric layer between the openings; a dielectric layer and an upper electrode sequentially stacked on the bottom electrode; and a first upper interconnection disposed on the upper electrode. According to the present invention, an effective surface area per a unit planar area of a capacitor with an MIM structure is enlarged to increase capacitance thereof.