The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Nov. 25, 2002
Applicant:
Inventors:
Dirk Többen, Munich, DE;
Thomas Schuster, Dresden, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/976 ;
U.S. Cl.
CPC ...
H01L 2/976 ;
Abstract
A field effect transistor contains a gate stack with a first layer, preferably a polysilicon layer, on a gate oxide disposed on a substrate, and over the first layer, a second layer, preferably a silicide layer, is provided. Next to the gate electrode is a contact that is separated from the layers of the gate electrode by a layer containing silicon and a spacer layer. Therefore a recrystallization in the silicide layer at elevated temperatures is prevented, which would otherwise cause bulging of the silicide layer toward the contact. It thus prevents shorts between the gate electrode and the contact.