The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2004

Filed:

Feb. 23, 2001
Applicant:
Inventors:

Akira Maekawa, Hitachinaka, JP;

Akira Owada, Hitachinaka, JP;

Yasushi Terui, Tsuchiura, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 4/910 ; H01J 4/932 ; H01J 3/934 ; H01D 5/944 ;
U.S. Cl.
CPC ...
H01J 4/910 ; H01J 4/932 ; H01J 3/934 ; H01D 5/944 ;
Abstract

In order to provide an equipment that permits easy elimination of interference ions even in a low resolution mass spectrometer, the isotope mass number information and the isotope presence ratio information for each element are stored, and processing is done as is shown in FIG. using such information and the measurement results, and the amount of target elemental ions is calculated by calculating and eliminating the amount of interference caused by other elemental isotopes to the target element. Because of this, when carrying out element analysis using a mass spectrometer with a relatively low resolution, the user can easily obtain the measurement result of the amount of any target elemental ions.


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