The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2004

Filed:

Jan. 02, 2003
Applicant:
Inventors:

Michiyuki Kono, Neyagawa, JP;

Manabu Kikuta, Kyotanabe, JP;

Masahito Nishiura, Nishinomiya, JP;

Fumihide Tamura, Kusatsu, JP;

Shigetaka Takamiya, Himeji, JP;

Taketo Toba, Takarazuka, JP;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 6/00 ; C08G 8/500 ;
U.S. Cl.
CPC ...
C08G 6/00 ; C08G 8/500 ;
Abstract

The present invention provides a novel production process for an ethylene oxide resin, in which, when the ethylene oxide resin is obtained, it is arranged that the resin should contain no antistatic agent, and further its water content is also easily controlled in not more than a definite amount, and the thermal damage of the above resin is prevented, and besides, the reduction of the cost can also be actualized. The production process for an ethylene oxide resin, according to the present invention, comprises the step of carrying out devolatilization of a solvent from a polymerization reaction liquid containing the solvent, thereby obtaining the ethylene oxide resin; with the production process being characterized by arranging that: after the devolatilization, the resin should have a solvent concentration of 0.01 to 30 weight % and a water content of not more than 200 ppm, and the resin should contain no antistatic agent.


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