The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2004
Filed:
Oct. 01, 2003
Applicant:
Inventor:
Gilles Amblard, San Jose, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract
Disclosed is a method of forming an integrated circuit line on a wafer using a lithographic technique. The method can include forming a photo resist line having a line width smaller than a desired line width of the integrated circuit line. The photo resist line can be reacted with a coating to form a mask line having a line width corresponding to the desired line width of the integrated circuit line and with a smaller line edge roughness (LER) than of the photo resist line.