The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2004

Filed:

May. 31, 2002
Applicant:
Inventors:

Koji Handa, Osaka, JP;

Keiichi Yoshizumi, Higashiosaka, JP;

Keishi Kubo, Moriguchi, JP;

Hiroyuki Takeuchi, Hirakata, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/124 ;
U.S. Cl.
CPC ...
G01B 1/124 ;
Abstract

A stylus having a curvature radius of 1 mm or less is attached to the extremity of a probe. When the profile of an object is measured with high precision by causing the stylus to follow a measurement surface of the object, a reference ball for calibration is first measured, thereby surface profiling the object. From the measurement data, a contact position where the stylus contacts with the object is determined. A positional error caused by a curvature radius of the stylus is corrected by using an angle of inclination of the measurement surface in that contact position. The amount of profile error in the contact position is extracted by using the profile error data pertaining to the stylus determined by measurement of the reference ball. The amount of profile error is added to the measurement data, thereby correcting the profile error caused by the curvature radius of the stylus.


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