The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Jun. 12, 2002
Takashi Kamono, Tochigi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a pellicle support frame which has a freely openable/closable lid and forms a pellicle space by using a pellicle film, and a pattern of a master facing the pellicle space is transferred onto a photosensitive substrate via a projection optical system. The apparatus includes a mechanism which opens/closes the lid, a nozzle arranged by selecting at least either one of a gas supply nozzle and a discharge nozzle, wherein at least either one of a gas supply and discharge is performed for the pellicle space via the selected nozzle, a device for measuring flexure of the pellicle film, a pressure detection device for detecting either one of a gas supply pressure and a discharge pressure, and a pressure control device for controlling the pressure detected by the pressure detection device. The pressure control device controls either one of the gas supply pressure and the discharge pressure so as to adjust a flexure value detected by the device for measuring flexure of the pellicle film to not more than a predetermined value.