The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Apr. 15, 2002
Alfred F. Renaldo, San Jose, CA (US);
Douglas J. Werner, Fremont, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A projection structure is deposited on a substrate having a top surface by applying a negative photoresist overlying the substrate, and positioning a mask overlying the substrate and lying in a mask plane generally parallel to the top surface. The mask is a negative mask that is opaque in a region defining a location where the projection structure is to be deposited. The method further includes exposing the negative photoresist through the mask, baking and developing the exposed negative photoresist, and depositing the projection structure through the exposed and etched negative photoresist.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile