The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Oct. 24, 2002
Heiko Gottfried, Schoeneck, DE;
Markus Pridoehl, Grosskrotzenburg, DE;
Berthold Trageser, Freigericht, DE;
Guido Zimmermann, Hanau, DE;
Stefan Heberer, Gelnhausen, DE;
Heike Muehlenweg, Nidderau, DE;
Degussa AG, Duesseldorf, DE;
Abstract
An aqueous dispersion containing abrasive particles comprises abrasive particles having superparamagnetic metal oxide domains in a non-magnetic metal oxide or non-metal oxide matrix. The abrasive particles of the aqueous dispersion can have an average particle size of below 400 nm and a BET surface area of 50 to 600 m /g. The dispersion can be produced by dispersing the abrasive particles with an energy of at least 200 kJ/m using a device in which the abrasive particles are first subjected to high pressure, then decompressed through a nozzle so that the abrasive particles collide with one another or against sections of wall in the device. The aqueous dispersion can be used for chemical mechanical polishing (CMP).