The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2004
Filed:
Jul. 10, 2001
Ruediger Held, Minneapolis, MN (US);
Cypress Semiconductor Corp., San Jose, CA (US);
Abstract
A method is provided for processing a semiconductor topography. In an embodiment, the method includes positioning a semiconductor topography against a carrier plate with a raised section. Such a method preferably allows a larger area capable of producing a target yield of semiconductor devices within dimensional specifications to be obtained than is obtained by positioning the topography against a carrier plate with a flat surface. As such, positioning a topography against a carrier plate with one or more raised sections may form a substantially planar upper surface in a larger area than in an area formed by positioning such a topography against a flat surface carrier plate. Furthermore, such a method is preferably conducted in a single polishing step. As such, a polishing system is provided which includes a carrier plate with a raised section adapted to planarize a semiconductor topography in one polishing step.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile