The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2004
Filed:
May. 01, 2002
David A. Kamp, Monument, CO (US);
Alan D. DeVilbiss, Colorado Springs, CO (US);
Celis Semiconductor Corporation, Colorado Springs, CO (US);
Abstract
A ferroelectric field effect transistor (FET) has a gate, source, drain, and substrate. A negative voltage is applied to the gate. Ground potential is applied to the source, drain, and substrate. The negative voltage has a magnitude at least equal to the coercive voltage of the FET. A positive voltage is then applied to the gate. Ground potential is applied to the source and substrate. The positive voltage is no less than the coercive voltage. Either a positive voltage or a ground potential is applied to the drain to write a logic state to the FET. A voltage is applied to the gate. Ground potential is applied to the source. A positive voltage is applied to the drain. The drain current is measured and compared to a compare current. The relative size of the drain current compared to the compare current is indicative of the stored logic state in the FET.