The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2004
Filed:
Nov. 15, 2001
Karl-Eugen Aubele, D-73312 Geislingen, DE;
Other;
Abstract
A method is used for dynamic manipulation and/or for adjustment of a module or a component in an optical system, in particular in a microlithographic projection exposure objective for manufacture of semiconductors. The module or component is displaced by at least two actuators, which have detectors for determining at least their relative path displacements. A position of the module or component is determined by at least two sensors, the sensors and the actuators, with their detectors communicating with one another in the manner of a control loop. At least one impulse is exerted on the module or component by the actuators. The timing of the impulse can be deliberately varied, to which end the displacement of the actuators is carried out with a time-variant velocity profile dictated as a function of a determined position s of the module or component. A position s of the module or component is re-determined after the velocity profile, has been executed. The aforementioned method steps are repeated until the desired position s of the module or component is reached.