The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2004

Filed:

Apr. 19, 2002
Applicant:
Inventors:

Michael T. Sheehan, Corpus Christi, TX (US);

James R. Sounik, Corpus Christi, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
C08F / ;
Abstract

A novel one-pot cost efficient process for the preparation of homo-, co- and terpolymers of p-hydroxystyrene or substituted p-hydroxystyrene and alkyl acrylates. The process involves polymerization of esters of p-hydroxystyrene (or its substituted analogs), alkyl acrylate monomers and/or one or more of ethylenically unsaturated monomers in an alcohol solvent in the presence of a free radical initiator. The reaction mixture containing the so formed polymer is subjected to transesterification conditions using a catalytic amount of catalyst to result in co- and/or terpolymers of p-hydroxystyrene without cleavage of the alkyl ester in the acrylate repeat unit, and then removing the catalyst from the system. Preferred embodiments include homopolymers of p-hydroxystyrene, copolymer of p-hydroxystyrene and tert-butyl acrylate and terpolymer of p-hydroxystyrene, tert-butyl acrylate and styrene. These polymers have a wide variety of applications including as photoresists in microelectronics industry.


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