The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2004
Filed:
Apr. 09, 2003
Chih-Yang Li, Mountain View, CA (US);
Tru-Si Technologies, Inc., Sunnyvale, CA (US);
Abstract
To reduce the edge roll off in a semiconductor wafering process, the wafer ( ) is subject to a plasma etch with an edge underetch. The edge underetch is achieved by means of a wafer holder ( ) that emits gas towards the wafer (e.g. a gas vortex) to draw the wafer towards the holder's body ( ). The plasma impinges on the wafer surface ( ) opposite to the body. Some of the gas emitted by the holder wraps around the wafer edge and dilutes the etchant near the wafer edge. Consequently, the etch proceeds slower near the edge (the edge is underetched). In some embodiments, the wafer is rotated around an axis ( ) passing through the wafer to increase the underetch.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile