The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2004

Filed:

Mar. 06, 2002
Applicant:
Inventors:

Masaaki Ikeda, Kyoto, JP;

Akihiro Funamoto, Kyoto, JP;

Motohiko Matsushita, Kyoto, JP;

Shigeru Aoyama, Kyoto, JP;

Assignee:

Omron Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 5/00 ; B29D 1/100 ;
U.S. Cl.
CPC ...
G03C 5/00 ; B29D 1/100 ;
Abstract

There is provided a manufacturing method of an optical device having a micro-asperity pattern that has various kinds of accurate three-dimensional shapes and is realized as thin films. A substrate is coated with a resin thin film made of a photosensitive resin, and the temperature of the resin thin film is controlled so as to be lower than the photosensitivity extinction temperature of the resin thin film. A micro-asperity pattern of a stamper is pressed against the resin thin film when the resin thin film is in a softened or melted state by pressurizing means, whereby a micro-asperity pattern is formed on the surface of the resin thin film.


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