The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 06, 2004
Filed:
Aug. 22, 2002
Shinji Matsui, Hyogo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A micro three-dimensional structure capable of producing a micro three-dimensional structure (micrometer-to nanometer-order outer shape) having a complicated structure, a production method therefor and production device therefor are provided. In the production method for the micro three-dimensional structure, performed are the step of irradiating a focused ion beam ( ) to a sample ( ) while supplying a material gas ( ) to form a first-layer deposit ( ), the step of releasing secondary electrons ( ) from the first-layer deposit ( ) hit by ions to allow the secondary electrons ( ) to form a terrace ( ) on the first-layer deposit ( ), a step of deflecting the focused ion beam ( ) in a desired direction of the terrace ( ) based on a set amount from a focal position controlling apparatus, a step of forming a second-layer deposit ( ) in a deflected position on the terrace ( ) based on the deflection amount, and a step of repeating the above steps to form a set micro three-dimensional structure.