The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Jun. 12, 2000
Shunji Kamijima, Haramura, JP;
Masatoshi Yonekubo, Haramura, JP;
Takashi Takeda, Suwa, JP;
Takao Nishikawa, Shiojiri, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A micromachine and a manufacturing method are provided for a micromachine that has a dynamic first microstructured portion serving as a drive portion, and a static second microstructured portion adapted to perform a switching function and which functions as an optical element. The second microstructured portion can be manufactured at least without complex steps, such as a silicon process, by forming a static second microstructure on the dynamic first microstructured portion, or in such a way as to be overlaid thereon by mold transfer. Thus, the microstructured portion of a complex shape can be easily formed with good reproducibility. When a plurality of elements are arranged in an array, similarly as in the case of a spatial light modulator, the stable reproduction thereof is achieved by the mold transfer. Thus, as compared with the case of manufacturing all elements in a silicon process, the probability of an occurrence of a defect is very low.