The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 29, 2004

Filed:

Nov. 09, 2000
Applicant:
Inventor:

Werner Kluft, 52078 Aachen, DE;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract

For a method for measuring process parameters of a material working process using a high energy beam ( ), in particular a laser beam, focused onto a working zone of a workpiece ( ), by measuring coaxially to the high energy radiation in the workspace zone the light intensity in the area of vapor capillaries ( ) produced by then high energy beam ( ) by means of an optical sensor ( ) scanning a picture field and supplying the resultant measuring signals to an evaluation means ( ), an optical sensor ( ) having a dynamic range of more than 70 db is used, and the measuring signals of sections of the picture field showing the area of the vapor capillaries ( ) and at least the area of the melting zone ( ) surrounding the vapor capillaries ( ) are simultaneously transmitted to the evaluation means ( ).


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