The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Jan. 26, 1998
Applicant:
Inventor:
Takahisa Shiozawa, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/754 ; G03B 2/772 ;
U.S. Cl.
CPC ...
G03B 2/754 ; G03B 2/772 ;
Abstract
An exposure method and apparatus wherein exposures are made repeatedly and wherein an amount of exposure is controlled on the basis of detection of an integrated light quantity of a portion of exposure light used for an exposure. In response to completion of each exposure or exposures of a determined number, a ratio between intensity of the exposure light upon a substrate being exposed and the portion of the exposure light is detected, which ratio is used for the exposure amount control.
Quick Actions:
Shiozawa, Takahisa. (2004). Exposure method and apparatus for detecting an exposure amount and for calculating a correction value based on the detected exposure amount (U.S. Patent No. 6757050). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6757050
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile