The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Sep. 30, 2002
Applicant:
Inventor:
Akiyuki Minami, Tokyo, JP;
Assignee:
Oki Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/768 ; G03B 2/758 ;
U.S. Cl.
CPC ...
G03B 2/768 ; G03B 2/758 ;
Abstract
In order to reduce a displacement in position between an under pattern and a resist pattern due to distortion, a reticle ( ) formed with reticle alignment marks ( ) at at least two points is used, reticle microscopes ( ) are respectively placed in association with positions of the reticle alignment marks ( ) at the time that the reticle ( ) is supported by a reticle stage ( ) and rotated about an optical axis (Z axis) of an image-forming optical system ( ) by 90°, and the reticle alignment marks ( ) are detected by any reticle microscope ( ) even if the reticle ( ) being supported by the reticle stage ( ) is rotated about the Z axis.