The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Nov. 13, 2001
Applicant:
Inventor:
Kiyoshi Arakawa, Tochigi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/758 ; G03B 2/762 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G03B 2/758 ; G03B 2/762 ;
Abstract
An exposure apparatus includes a reticle stage which holds a reticle, a reticle surface plate which supports the reticle stage, a projection optical system which projects a pattern of the reticle onto a substrate, a shield, and a gas supply. The shield surrounds a space, between the reticle stage and the reticle surface plate, through which exposure light passes, and it shields the space from outside. The gas supply supplies inert gas into the space shielded by the shield.