The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Sep. 29, 2000
Applicant:
Inventors:
Hanna Bamnolker, Cupertino, CA (US);
Prashant Phatak, Sunnyvale, CA (US);
Usha Raghuram, San Jose, CA (US);
Sam Geha, Sunnyvale, CA (US);
Assignee:
Cypress Semiconductor Corporation, San Jose, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/1461 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/1461 ;
Abstract
The present invention provides a method of forming, in semiconductor substrates, contact openings having low contact resistance. The method involves, in particular, the introduction of a “soft etch” cleaning step that is used to clean the bottom of the contact openings. The “soft etch” cleaning step uses fluorocarbon chemistry. It is shown that the resulting resistance of the contact openings is reduced.