The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Dec. 11, 2000
Koji Suzuki, Mihama-ku, JP;
Kawasaki Microelectronics, Inc., Chiba, JP;
Abstract
A method for producing semiconductor devices and a production apparatus having a superior ability to control the process are disclosed. In an embodiment according to this invention, a surface of a semiconductor substrate is processed using a process gas excited by two electromagnetic waves with their powers change separately and periodically, keeping a predetermined timing relationship with each other. In addition, a bias with a voltage that also changes periodically, keeping a predetermined relationship with change of the electromagnetic waves, can be applied to the substrate. Further, the process is controlled by monitoring an optical emission from the process gas synchronously with the periodic change of the electromagnetic wave or the bias.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile