The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2004
Filed:
Jan. 07, 2002
Chuang-Chia Lin, San Pablo, CA (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A surface micromachining process for the fabrication of three-dimensional micro-hinges directly on silicon on insulator wafers. The process includes the steps of (a) defining openings around the surface of a desired hinge pin in a single layer of a silicon single crystal; (b) subjecting the openings to an etching process for removal of oxide material that is located in contiguous relation to the openings under the area of a hinge; (c) growing thermal oxide to define a gap between the hinge pin and a subsequently deposited polysilicon cap; (d) immediately depositing a thin layer of a chemical vapor deposited oxide sufficient to cover fine gaps not completely covered by the thermal oxide; depositing polysilicon and etching to define a hinge cap; and further etching to allow a mirror to be lifted out of the silicon wafer.