The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2004

Filed:

Jul. 25, 2000
Applicant:
Inventors:

Shin Masuhara, Tokyo, JP;

Yuichi Aki, Tokyo, JP;

Kenji Yamamoto, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 7/00 ;
U.S. Cl.
CPC ...
G11B 7/00 ;
Abstract

This invention relates to a manufacturing method for an optical information recording medium and a manufacturing device for an optical information recording medium, and is applicable for instance to devices for optical disks, capable of focusing a laser beam from an exposure semiconductor laser at high density onto a base disk. This invention compensates the chromatic aberrations of the objective lens with a chromatic aberration optical system or compensates for fluctuations in the wavelength by regulating the temperature of the semiconductor laser.


Find Patent Forward Citations

Loading…