The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Oct. 08, 2002
Applicant:
Inventor:
Hugo Matthieu Visser, Eindhoven, NL;
Assignee:
Koninklijke Philips Electronics N.V., Eindhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G21K 5/00 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/742 ; G21K 5/00 ;
Abstract
A lithographic projection apparatus comprises a contaminant trap ( ) for trapping debris from the radiation source (LA) or from the resist (RL) on a substrate (W), which trap comprises two sets ( ) of channels ( ) arranged radially around the optical axis of the projection beam (PB) with a space ( ) between them. Gas is supplied to the space. The flow resistance of the channels ensures that the gas pressure outside the trap ( ) is much lower then that inside.