The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Jun. 24, 2002
Applicant:
Inventor:
George Thomas, Fremont, CA (US);
Assignee:
Novellus Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 2/732 ; H01L 2/166 ; H05H 1/36 ;
U.S. Cl.
CPC ...
G01R 2/732 ; H01L 2/166 ; H05H 1/36 ;
Abstract
In one embodiment, a radio frequency (RF) configuration in a plasma processing system includes an RF electrode driven by an RF signal source and a non-RF electrode coupled to an electronic module. A filter coupled to the non-RF electrode is configured to provide maximum attenuation at or near an RF signal frequency, while allowing signals associated with the electronic module to pass. The filter may be placed as close to the non-RF electrode as possible. The filter may be, for example, a band stop filter such as a parallel resonant circuit having a resonant frequency at or near an RF signal frequency.