The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Feb. 07, 2002
Jun Dong Kim, Seoul, KR;
Kyung Won Lee, Seoul, KR;
Hynix Semiconductor Inc., Ich'on, KR;
Abstract
Disclosed is a bit line-manufacturing method, by which a bit line having a fine width can be easily manufactured. The method comprises the steps of: successively forming a conducting layer and an insulating layer on a substrate, the conducting layer serving to form a bit line; forming a first mask pattern on the insulating layer in such a manner that a desired region of the insulating layer is exposed; etching the first mask pattern, so as to form a second mask pattern; removing the insulating layer using the second mask pattern; removing the second mask pattern; and removing the conducting layer using the remaining insulating layer as a mask, so as to form the bit line.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile