The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6752894 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 22, 2004

Filed:

Dec. 14, 2001
Applicant:
Inventors:

Naiyong Jing, Woodbury, MN (US);

George Van Dyke Tiers, St. Paul, MN (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08J 7/04 ;
U.S. Cl.
CPC ...
C08J 7/04 ;
Abstract

This invention concerns a process for modifying a polymeric substrate by contacting the surface with a photoreactive solution of an inorganic photochemical electron donor while irradiating the surface with actinic radiation. Patterns of modified and unmodified surfaces can be produced. Polymeric substrates with modified surfaces may be effectively bonded to polymer films to form composite articles. The process has particular applicability to the surface modification of fluorinated polymers.


Find Patent Forward Citations

Jing, Naiyong. (2004). Process for modifying a polymeric surface (U.S. Patent No. 6752894). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6752894

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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