The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 22, 2004
Filed:
Jun. 19, 2002
Masato Kawai, Tokyo, JP;
Akihiro Nakamura, Tokyo, JP;
Tooru Nagasaka, Tokyo, JP;
Shigeru Hayashida, Tokyo, JP;
Nippon Sanso Corporation, Tokyo, JP;
Abstract
The gas separation and purification process can recover efficiently a valuable gas such as krypton and xenon to be used as an atmospheric gas in a semiconductor manufacturing equipment etc. by means of PSA process. In the process for separating a valuable gas in the form of purified product from a mixed gas, used as a raw gas, containing the valuable gas by means of pressure swing adsorption process, the valuable gas is separated and purified by using as the pressure swing adsorption process a combination of equilibrium pressure swing adsorption process for separating gas components based on the difference in equilibrium adsorption and rate-dependent pressure swing adsorption process for separating the gas components based on the difference in adsorption rates.