Developing apparatus and developing method

Abstract

A substrate (W) is held in an approximately horizontal position by a substrate holder ( ) and is rotated by a spinning motor ( ). A rinsing liquid supply nozzle ( ) is rotatably supported at its one end by a second nozzle movement mechanism ( ) and is rotated to pass over the substrate (W). The rinsing liquid supply nozzle ( ) is rotated to pass over the substrate (W) and at the same time to discharge a rinsing liquid from its discharge unit. At this time, the rinsing liquid supply nozzle ( ) and the substrate (W) are rotated so that a virtual scanning direction (La) of the substrate (W) is substantially perpendicular to a direction of extension of the rinsing liquid supply nozzle ( ). That is, since the rinsing liquid supply nozzle ( ) is shifted in the virtual scanning direction (La), a non-supplying area of the substrate (W) where a rinsing liquid is not supplied can successively be made up and eliminated as the scanning by the nozzle ( ) proceeds.