The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2004
Filed:
Oct. 02, 2001
Applicant:
Inventor:
John V. Sandusky, Albuquerque, NM (US);
Assignee:
Accent Optical Technologies, Inc., Bend, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 4/00 ; G01N 2/155 ;
U.S. Cl.
CPC ...
G01J 4/00 ; G01N 2/155 ;
Abstract
Devices and methods for differential numerical aperture analysis of samples, utilizing angle-of-incidence measurements resulting from variable illumination or observation numerical apertures, or both. Metrology applications are provided, and more particularly including scatterometer, ellipsometer and similar analysis methods, including bi-directional reflectance or transmission distribution function measurement. The provided devices and methods enable analysis of critical dimensions of samples utilizing a minimum of moving parts, with the range of striking or scattering angles varied by a variable numerical aperture or apertures.