The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2004
Filed:
Dec. 29, 2000
Takashi Miyachi, Saitama-ken, JP;
Nikon Corporation, Tokyo, JP;
Abstract
A main control system determines a mode of a focusing control based on both data representing the surface condition of a divided area and data for a shape of an illumination area on a wafer. Then, the main control system controls actuators based on detection results from a focus sensor, and performs the focusing control of a substrate stage for holding the wafer in respect to a projection optical system. Simultaneously with the focusing control, the main control system controls a wafer stage driving block to control the synchronous movement of a reticle stage and substrate table. Thereby a pattern formed on a reticle is transferred onto the divided area on the wafer via the projection optical system. Not premising a high focusing control driving practicability, the pattern is transferred onto the substrate without serious deterioration of imaging performance.