The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2004

Filed:

Jan. 22, 2002
Applicant:
Inventors:

Ian D. French, Hove, GB;

Pieter J. Van der Zaag, Pyrford, GB;

Daan L. De Kubber, Roermond, NL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/144 ;
U.S. Cl.
CPC ...
H01L 2/144 ;
Abstract

A method of improving the electrical conductivity of transparent conducting lines ( ) carried on a substrate ( ), particularly address lines on the active plate for a pixellated device such as an active matrix liquid crystal display or the like fabricated using a low mask count process, involves forming the lines on the substrate from a deposited layer of transparent conducting material ( ), e.g. ITO, and provided on their upper surface with a covering layer ( ) extending from at least one end ( ) and partially covering the surface, and then performing an electroplating operation to plate the lines ( ) with a plating potential being applied at that end. The covering layer ( ) assists in achieving a more uniform plated layer ( ) along the length of the line. The covering layer preferably comprises photoresist defined by selective patterning and partial etching of a deposited photoresist layer ( ) used for patterning the transparent layer ( ). In a pixellated device, pixel electrodes ( ) are also defined from the transparent layer.


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