The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2004
Filed:
Sep. 30, 2002
Minuta Technology Co., Ltd., , KR;
Abstract
A mask pattern is formed on a substrate by using a solvent absorbent mold having a pattern structure with a relief and an intaglio portion. A mask layer dissolved in a solvent to obtain fluidity is prepared on the substrate. The mold is pressed onto the mask layer with a predetermined pressure, and a portion of the mask layer that contacts with the relief portion of the mold is introduced into the intaglio portion thereof. Then, the mold absorbs the solvent contained in the mask layer to thereby solidify the mask layer. Next, the mold is separated from the substrate and the portion of the mask layer that contacts with the relief portion of the mold is removed, thus finally obtaining the desired minute mask pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile