The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2004
Filed:
Dec. 27, 1999
Yutaka Hasegawa, late of Kawasaki, JP;
Kazuya Yamada, Tokyo, JP;
Yoshie Akai, Yokohama, JP;
Norihisa Saito, Yokohama, JP;
Yoshikazu Matsubayashi, Yokosuka, JP;
Yasushi Yamaguchi, Kawaguchi, JP;
Hisao Oomura, Yokohama, JP;
Yumiko Abe, Yokohama, JP;
Atsushi Ohara, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A high-pressure treatment apparatus comprises a first solid reservoir, a second solid reservoir connected to the first solid reservoir through a first connecting pipe, a high-pressure reactor connected to the second solid reservoir through a second connecting pipe, means for feeding reaction medium into the high-pressure reactor, a first sealing unit and a second sealing unit intervened respectively in the first connecting pipe and second connecting pipe, a first fluid feed unit for feeding a first fluid between the first sealing unit and the second sealing unit, a second fluid feed unit for feeding a second fluid between the second sealing unit and the high-pressure reactor, and means for opening the second sealing unit at the time of shut-off of the first sealing unit and controlling the first fluid and the second fluid to form a pressure-gradient so that pressure between the first sealing unit and the second sealing unit and pressure between the second sealing unit and the high-pressure reactor decrease gradually toward the high-pressure reactor.