The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2004
Filed:
Jul. 12, 2002
Applicant:
Inventors:
Ferencz S. Denes, Madison, WI (US);
Sorin O. Manolache, Madison, WI (US);
Amy C. Lee Wong, Madison, WI (US);
Eileen B. Somers, Madison, WI (US);
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/467 ;
U.S. Cl.
CPC ...
C02F 1/467 ;
Abstract
A method for disinfecting water and other dense fluid media containing microorganisms is carried out in a dense media plasma reactor. The plasma reaction in the reactor produces reactive species, such as electrons, ions, and free radicals that promote the inactivation of the microorganisms. In various embodiments, the plasma reaction also sputters off minute antimicrobial particles of the electrically conducting material from which the electrodes are made.