The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2004

Filed:

Jul. 12, 2002
Applicant:
Inventors:

Ferencz S. Denes, Madison, WI (US);

Sorin O. Manolache, Madison, WI (US);

Amy C. Lee Wong, Madison, WI (US);

Eileen B. Somers, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C02F 1/467 ;
U.S. Cl.
CPC ...
C02F 1/467 ;
Abstract

A method for disinfecting water and other dense fluid media containing microorganisms is carried out in a dense media plasma reactor. The plasma reaction in the reactor produces reactive species, such as electrons, ions, and free radicals that promote the inactivation of the microorganisms. In various embodiments, the plasma reaction also sputters off minute antimicrobial particles of the electrically conducting material from which the electrodes are made.


Find Patent Forward Citations

Denes, Ferencz. (2004). Method for disinfecting a dense fluid medium in a dense medium plasma reactor (U.S. Patent No. 6749759). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6749759

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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