The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2004
Filed:
Feb. 22, 2001
Applicant:
Inventors:
Günter Fuhr, Berlin, DE;
Thomas Schnelle, Berlin, DE;
Rolf Hagedorn, Berlin, DE;
Torsten Müller, Berlin, DE;
Assignee:
Evotec Technologies GmbH, , DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/7453 ;
U.S. Cl.
CPC ...
G01N 2/7453 ;
Abstract
Electrode arrangement ( ) in a microsystem adapted for dielectrophoretic manipulation of particles ( ) in a suspension fluid in a channel ( ), wherein at least one electrode ( ) is arranged on a lateral wall of the channel ( ), the electrode ( ) consisting of a plurality of electrode segments adapted to generate at least one field gradient for influencing the movement paths of the particles ( ) in the channel ( ). In one embodiment of the invention, the particles are moved in the microsystem by exposure to centrifugal and/or gravitational forces.