The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2004
Filed:
Feb. 04, 2003
Agilent Technologies, Inc., Palo Alto, CA (US);
Abstract
A first resist is deposited on at least a portion of a substrate (or existing feature on the substrate) that will underlie a feature in a nonphotoimagable material that is to be deposited on the substrate. Thereafter, the nonphotoimagable material is deposited so that it overlaps at least a portion of the first resist. A second resist is then deposited on at least a portion of the nonphotoimagable material, and a feature is patterned on the second resist. Subsequently, the part is sandblasted until the first resist is exposed, and the first and second resists are then removed. In one embodiment, the nonphotoimagable material is deposited on a channel plate and used to seal at least a switching fluid between the channel plate and another substrate.