The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
May. 31, 2002
Rocco A. Orsini, Long Beach, CA (US);
Michael B. Petach, Redondo Beach, CA (US);
Northrop Grumman Corporation, Los Angeles, CA (US);
Abstract
An EUV radiation source ( ) that generates a sheet ( ) of a liquid target material that has a width that matches the desired laser spot size ( ) for good conversion efficiency and a thickness that matches the laser beam/target interaction depth. The EUV source ( ) includes a reservoir ( ) containing a pressurized cryogenic liquid target material, such as liquid Xenon. The reservoir ( ) also includes an array ( ) of closely spaced orifices ( ). The liquid target material is forced through the orifices ( ) into a vacuum chamber as separated liquid stream filaments ( ) of the target material that define the sheet ( ). The liquid streams freeze to form an array of frozen target filaments ( ). A laser beam ( ) is directed to a target area ( ) in the vacuum chamber where it irradiates the stream of filaments ( ) to create a plasma ( ) that emits EUV radiation ( ).