The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Oct. 11, 2002
Yong-Sheng Chao, Storrs, CT (US);
Other;
Abstract
A method and apparatus for dynamically controlling variation in an attribute of a light beam employing materials with unusually high electrooptical coefficients that are subject to optical damage from the light beam being controlled. The method includes providing a transmission medium composed of a high sensitivity electrooptic material transparent to the light beam and having a nonzero electrooptic coefficient, where the medium is adapted to receive, propagate, and output the light beam. The medium is subjected to an electric field, the strength of which is controlled to determine the amount of variation of the light beam attribute. The field is generated by electrodes appropriately enclosing the medium and inducing a voltage across the electrodes. The medium is illuminated by a suppressing light source, the illumination being intense enough to significantly reduce charge distribution inhomogeneity within the medium. The intensity of the suppressing illumination is at least twice the intensity of the light beam being controlled.