The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Mar. 26, 2002
Nobuaki Ueki, Saitama, JP;
Hideo Kanda, Saitama, JP;
Fuji Photo Optical Co., Ltd., Saitama, JP;
Abstract
An imaging optical system for an oblique incidence interferometer comprises first and second optical systems and an intermediate imaging surface therebetween. Each of the first and second imaging optical systems comprises two telecentric lenses, arranged afocal to each other, having respective focal lengths different from each other. A first image of a surface to be inspected having a deformed aspect ratio with respect to this surface is formed on the intermediate imaging surface by way of the first imaging optical system. The second imaging optical system is arranged such that the first image is focused onto the imaging surface of the interferometer as a second image corrected so as to have substantially the same aspect ratio as that of the surface to be inspected.