The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2004
Filed:
Dec. 07, 2001
Motorola, Inc., Schaumburg, IL (US);
Abstract
An apparatus for compensating light exposure on different, subsequently irradiated target areas ( ) in a photosensitive medium ( ) on a semiconductor wafer ( ). In order to improve exposure dose uniformity the apparatus comprises a mask filter ( ) with a plurality of oblong transparent ( ) and oblong opaque elements ( ) inserted between a light source ( ) and said photosensitive medium ( ) so that light ( ) traverses through said plurality of transparent elements ( ) to expose the photosensitive medium. Each of said plurality of oblong opaque elements ( ) is rotatable around a longitudinal axis ( ) so as to define the area masked by the projection of the opaque element on the photosensitive medium and to continuously adjust a ratio between irradiated and non-irradiated areas on the photosensitive medium.